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Automated Benches
Automated wet processing equipment that provide economical, turnkey solutions
accommodating baths, rinsers, cleaners, and other modules. More...
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Semi-Automatic Benches
Wafab's semi-automated linear transfer systems are designed for processes using two or
more processing tanks. More... |
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Manual Benches
Manual wet processing equipment that provide economical, turnkey solutions
accommodating baths, rinsers, cleaners, and other modules. More... |
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Solar Cell Processing
Wafab's standard bottle wash station was designed to clean and hold up to 8 one-gallon
bottles More... |
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Stainless Steel Recovery Cabinet
This is a 304 stainless steel gravity fed, dual 55 gallon solvent recovery cabinet with complete PLC control and automated drum switch over when full. More... |
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Chemical Carts
WAFAB's Chemtran™ series of chemical carts are specifically designed to safely transport
fresh or spent chemistry throughout the fab. More... |
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Quartz Tanks
Our Megatherm™ High Temperature Quartz Baths were developed for resist stripping, RCA cleans, and silicon nitride etch. More...
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Filtered Systems
The first Center Feed™ recirculating and filtered bath for the semiconductor industry. The
Chemkleen™ bath is primarily used for HF, BOE, and KOH applications. More... |
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Bottle Wash Station
Wafab's standard bottle wash station was designed to clean and hold up to 8 one-gallon
bottles More... |
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Immersion Pumps
WAFAB designed its immersion pumps exclusively to meet the rigorous requirements of the semiconductor industry for recirculating, filtered etch modules. More... |
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Temperature Controlled Circulators
WHRV™ and WHO™ are specifically designed to control temperature in filtered etch
modules and other types of chemical tanks. More... |
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Quick Dump Rinser
The Microkleen™ Quick Dump Rinser is designed with top adjustable spray rails, external
bottom fill rails, and a larger dump door allowing it to dump in seconds. More... |
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Pump Stations
WAFAB's Chemblast™ series of pump stations are designed for situations where there is
no AWN available, or the process tool is located away from the AWN. More... |
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